Webinar

Advanced ICP-OES Analysis of Plating Baths: Precision, Sensitivity, and Robust Process Control

Description

Are you facing challenges in monitoring complex plating bath matrices? Watch this webinar to explore how state-of-the-art ICP-OES instrumentation—featuring DSOI plasma observation technology—delivers enhanced sensitivity and matrix tolerance for the detection and quantification of key elements in electroplating and electroless deposition processes.

We’ll cover:

- The chemistry and process control requirements for plating baths, including major, minor, and trace element analysis.
- Strategies for overcoming high matrix concentrations, spectral interferences, and dynamic range demands.
- Real-world application data for nickel and copper baths, including spike recovery results, detection limits, and regulatory compliance.
- How the SPECTROGREEN ICP-OES enables fast, accurate, and reliable measurements—even in the most challenging environments.

Discover how you can optimize bath composition, ensure product quality, and meet environmental regulations with confidence. This session is ideal for laboratory professionals, process engineers, and anyone seeking deeper insight into analytical best practices for plating solutions.

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