Application Brief

ICP-OES: Limits of Detection of Trace Elements in Hydrofluoric Acid

Hydrofluoric acid plays a critical role in industries ranging from semiconductor manufacturing to petrochemical refining and battery production. Ensuring its purity is essential, especially for applications requiring ultra-trace detection levels, such as Very Large Scale Integration (VLSI) and Super Large Scale Integration (SLSI) processes. This application report demonstrates a robust method for elemental analysis of hydrofluoric acid, achieving detection limits in the low µg/L range for a wide array of trace elements including Ag, Al, As, B, and Li.

Utilizing the advanced capabilities of ICP-OES technology, the study highlights the effectiveness of Dual Side-On plasma observation for enhanced sensitivity and precision. The method employs quartz sample introduction components, which, despite not being HF-resistant, offer superior measurement accuracy and cost-efficiency over traditional materials. Calibration was performed using certified multielement standards. Fast sample-to-sample times of less than 2.5 minutes ensure high throughput without compromising data quality.

The SPECTROGREEN ICP-OES system, featuring the proprietary ORCA spectrometer design and UV PLUS technology, delivers comprehensive spectral coverage and eliminates the need for purge gases and water cooling. Its automation compatibility and high matrix tolerance make it an ideal solution for laboratories seeking reliable, fast, and cost-effective trace element analysis in challenging matrices like hydrofluoric acid.

Key Benefits:
- Achieve µg/L detection limits for over 25 trace elements in HF matrices
- Fast, automated analysis in under 2.5 minutes per sample
- Reduced operational costs with water-free cooling and purge-free optics

Download the full application report to explore how the SPECTROGREEN ICP-OES can streamline your trace element analysis in hydrofluoric acid with unmatched precision and efficiency.